Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions
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=== SFOCUS === | === SFOCUS === | ||
SFOCUS used the bottom AE mark to adjust the | |||
=== PDEFBE === | === PDEFBE === | ||
| Line 321: | Line 321: | ||
=== SFOCUS === | === SFOCUS === | ||
SFOCUS used the bottom AE mark to adjust the | |||
=== PDEFBE === | === PDEFBE === | ||