Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!DRIFT | !DRIFT | ||
| | |This subprograms scans the DRIFT mark. The DRIFT mark can either be a BE mark or an alignment mark on the substrate. By scanning the DRIFT mark during exposure, the machine can positionally adjust the exposed pattern. | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!HEIMAP | !HEIMAP | ||
| | |This subprogram measures the height of the substrate to be exposed. | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!SETWFR | !SETWFR | ||
| | |This subprograms scans the global marks of the substrate. | ||
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!CHIPAL | !CHIPAL | ||
| | |This subprogram scan a set of chip marks on the substrate. | ||
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