Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
|'''[[Specific_Process_Knowledge/Lithography/ZEP520A|ZEP520A]]''' | |'''[[Specific_Process_Knowledge/Lithography/ZEP520A|ZEP520A]]''' | ||
|Positive resist, contact | |Positive resist, contact [mailto:Lithography@danchip.dtu.dk Lithography] if you plan to use this resist | ||
|ZEON | |ZEON | ||
|Positive resist | |Positive resist | ||
| Line 189: | Line 189: | ||
|Positive | |Positive | ||
|ZEON | |ZEON | ||
|Not approved | |Not approved. Low dose to clear, can be used for trilayer (PEC-free) resist-stack. Please contact [mailto:Lithography@danchip.dtu.dk Lithography] for information. | ||
|[[media:ZEP7000.pdf|ZEP7000.pdf]] | |[[media:ZEP7000.pdf|ZEP7000.pdf]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]] | ||