Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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|'''[[Specific_Process_Knowledge/Lithography/ZEP520A|ZEP520A]]''' | |'''[[Specific_Process_Knowledge/Lithography/ZEP520A|ZEP520A]]''' | ||
|Positive | |Positive resist, contact e-beam@danchip.dtu.dk if you plan to use this resist | ||
|ZEON | |ZEON | ||
|Positive resist | |Positive resist | ||