Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual: Difference between revisions
Created page with "= Purpose, location and technical specifications = The JEOL JBX-9500FS electron beam lithography system is a spot electron beam lithography system designed for use in writin..." |
|||
| Line 313: | Line 313: | ||
*Execute INITBE; click 'INITBE/Execute'. | *Execute INITBE; click 'INITBE/Execute'. | ||
'''If the machine cannot find the marks:''' Increase scan width to 40 µm and execute the subprogram again. Inspect the | |||
[[Specific_Process_Knowledge/Lithography/EBeamLithography/JBX9500Manual#Troubleshooting|troubleshooting]] section for detailed instructions. | |||
=== Execute 'daily' === | === Execute 'daily' === | ||