Specific Process Knowledge/Lithography/EBeamLithographyManual: Difference between revisions

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 = Troubleshooting =
-    No EBX Menu is open in any of the desktops: Open a console (click on arrow above the text ‘CPU’ on bottom menu bar) and from location (DTU)/ type ‘ebxmenu’.
+'''No EBX Menu is open in any of the desktops:''' Open a console (click on arrow above the text ‘CPU’ on bottom menu bar) and from location (DTU)/ type ‘ebxmenu’.
-    The ACHK or WRTEST programs are nowhere visible: Open Analysis form EBX Menu; from here you can find ACHK and WRTEST.
+'''The ACHK or WRTEST programs are nowhere visible:''' Open Analysis form EBX Menu; from here you can find ACHK and WRTEST.
-    I forgot to tick the EXCH EVAC before transferring my cassette from the e-beam writer to the autoloader: Transfer your cassette back into the e-beam ('Carry in'), then tick 'EXCH EVAC' on, and click 'Carry out' to transfer the cassette to the autoloader and pump down the exchange chamber
+'''I forgot to tick the EXCH EVAC''' before transferring my cassette from the e-beam writer to the autoloader: Transfer your cassette back into the e-beam ('Carry in'), then tick 'EXCH EVAC' on, and click 'Carry out' to transfer the cassette to the autoloader and pump down the exchange chamber
-Basic unix operations
+== Basic unix operations ==
+<pre>
-cd job
+cd job                               Change directory to 'job'
-	 Change directory to 'job'
+cd ..                                Go one directory up (parent directory)
-cd ..
+dir 	                             List the directories and folders
-	 Go one directory up (parent directory)
+CTRL+p (CTRL+n)                      Scroll to previous (next) command
-dir 	 List the directories and folders
+Click on middle mouse button         Copy highlighted text, or paste copied text
-CTRL+p (CTRL+n) 	 Scroll to previous (next) command
+Tripple-click on left mouse button   Highlights all text in a window (works in some windows only)
-Click on middle mouse button
+</pre>
-	 Copy highlighted text, or paste copied text
-Tripple-click on left mouse button
-	 Highlights all text in a window (works in some windows only)
 == Calibration problems ==
-    No current can be detected when executing CURRNT: Call one of the contact persons to get help.
+'''No current can be detected when executing CURRNT:''' Use another condition file or call one of the contact persons to get help.
-    The DISTBE subprogram runs for more than 15 minutes: Stop the subprogram from the calibration window (Command/Subprogram Stop). Click 'DISTBE/Edit Parameter'. Click 'Settings'. Change the scan position by 0.2 microns, both in X and Y. Save and execute DISTBE again. If DISTBE runs successfully, acknowledge the write to memory request, and run the last subprogram of the 'daily' batch manually. If it does not help, call one of the contact persons for help.
+'''The DISTBE subprogram runs for more than 15 minutes:'''
+*Stop the subprogram from the calibration window (Command/Subprogram Stop).
+*Click 'DISTBE/Edit Parameter'. Click 'Settings'.
+*Change the scan position by 0.2 microns, both in X and Y.
+*Add a few nanometer to the 'allowable convergence value'.
+*Save and execute DISTBE again.
+If DISTBE runs successfully, acknowledge the 'write to memory'-request, and run the last subprogram of the 'daily' batch manually. If it does not help, call one of the contact persons for help.
-    The detection of AE/BE or wafer marks gives an either too saturated or too noisy signal: Edit the AGCAE/AGCBE or AGCRG programs by entering the position of your AE/BE or wafer mark and execute the program. When the program finish successfully, apply the settings to other relevant subprograms; see 'the INITAE or INITBE mark cannot be detected' section.
+'''The detection of AE/BE or wafer marks gives an either too saturated or too noisy signal:'''
+*Edit the AGCAE/AGCBE or AGCRG programs by entering the position of your AE/BE or wafer mark and execute the program.
+*When the program finish successfully, apply the settings to other relevant subprograms; see 'the INITAE or INITBE mark cannot be detected' section.
-    The INITAE or INITBE mark cannot be detected: The system has probably drifted too far away from the mark to be able to detect the mark. Increase the scan width by doing this:
+'''The INITAE or INITBE mark cannot be detected:'''
-        Highlight INITAE and click 'Edit parameter'
+The system has probably drifted too far away from the mark to be able to detect the mark. Increase the scan width by doing this:
-        From the INITAE window, click 'AE mark detection condition Setting'
+*Highlight INITAE and click 'Edit parameter'
-        Increase the scan width to around 40 µm, click apply, and execute INITAE again
+*From the INITAE window, click 'AE mark detection condition Setting'
-        If the mark has been detected, click Update in the INITAE-window when the subprogram has finished
+*Increase the scan width to around 40 µm, click apply, and execute INITAE again
-        Decrease the scan width to its original value, click apply and execute INITAE again
+*If the mark has been detected, click Update in the INITAE-window when the subprogram has finished
+*Decrease the scan width to its original value, click apply and execute INITAE again
-    The same procedure applies to INITBE; here, the scan width can be increased to more than 40 µm, though. If the marks still cannot be detected, call one of the contact persons to get help.
+The same procedure applies to INITBE; here, the scan width can be increased to more than 40 µm, though. If the marks still cannot be detected, call one of the contact persons to get help.
+When the AE and BE marks has been found, the settings should be applied to all other relevant subprograms:
-    When the AE and BE marks has been found, the settings should be applied to all other relevant subprograms:
+*Click 'Setting..' in the INITAE window
+*Click 'Applies to another subprogram' in the 'detection condition' window
+*Click 'All Select' in the 'applies to another subprogram' window; this highlights all subprograms on the list. Click 'Subprograms that can be set' to execute.
-        Click 'Setting..' in the INITAE window
-        Click 'Applies to another subprogram' in the 'detection condition' window
-        Click 'All Select' in the 'applies to another subprogram' window; this highlights all subprograms on the list. Click 'Subprograms that can be set' to execute.
+The same procedure applies to the BE mark detection. Test whether subprograms can be executed by running e.g. SFOCUS and PDEFBE (quite short programs).
-    The same procedure applies to the BE mark detection. Test whether subprograms can be executed by running e.g. SFOCUS and PDEFBE (quite short programs).
 == Alignment problems ==
-    SETWFR cannot detect my P and Q marks: Unload your wafer/chip, remove the resist from your wafer marks and repeat your exposure with manual alignment:
+'''SETWFR cannot detect my P and Q marks:''' Unload your wafer/chip, remove the resist from your wafer marks and repeat your exposure with manual alignment:
-    Alignment commands for manual alignment (see 'sdf- and jdf-file preparation' manual):
-    Change the global mark detection in the sdf-file: GLMDET M (i.e. manual detection). Recompile the magazine file.
-    Calibrate as without alignment.
-    Execute exposure, wait until the machine prompts for action:
-        The machine will start a subprogram 'SETWFR' right before the exposure and move the stage to the position of the P-mark as stated in the jdf-file. Click 'YES' to manually align the machine to the global marks. In order to move the stage to the correct position of the P-mark (as detected with the optical pre-alignment), open the 'Stg' program from the EBX Menu.
+'''Alignment commands for manual alignment (see 'sdf- and jdf-file preparation' manual):'''
-        Move the target position (stage position) by clicking 'Setting...' and edit the X and Y parameters to the values found from the pre-alignment. Click 'Movement' to execute the movement.
+*Change the global mark detection in the sdf-file: GLMDET M (i.e. manual detection). Recompile the magazine file.
-        From the sspvideo (can be opened by 'Image' from the EBX Menu), start the SEM from 'Change/SEM'. Adjust the Brightness/Contrast and scan width by opening the Image Setting and Image Adjustment windows ('Setting...' and 'Adjustment...' buttons).
+*Calibrate as without alignment.
-        Find the P-mark by adjusting the stage position using the step movement from the stage controller. When the mark is centered, click 'Pattern writing continuation' and repeat the procedure for the Q-mark. Finish the global alignment by clicking 'Pattern writing continuation', and the exposure will start.
+*Execute exposure, wait until the machine prompts for action:
+*The machine will start a subprogram 'SETWFR' right before the exposure and move the stage to the position of the P-mark as stated in the jdf-file. Click 'YES' to manually align the machine to the global marks. In order to move the stage to the correct position of the P-mark (as detected with the optical pre-alignment), open the 'Stg' program from the EBX Menu.
+*Move the target position (stage position) by clicking 'Setting...' and edit the X and Y parameters to the values found from the pre-alignment. Click 'Movement' to execute the movement.
+*From the sspvideo (can be opened by 'Image' from the EBX Menu), start the SEM from 'Change/SEM'. Adjust the Brightness/Contrast and scan width by opening the Image Setting and Image Adjustment windows ('Setting...' and 'Adjustment...' buttons).
+*Find the P-mark by adjusting the stage position using the step movement from the stage controller. When the mark is centered, click 'Pattern writing continuation' and repeat the procedure for the Q-mark. Finish the global alignment by clicking 'Pattern writing continuation', and the exposure will start.