Specific Process Knowledge/Lithography/EBeamLithographyManual: Difference between revisions

Revision as of 12:27, 22 June 2015 view source Tigre (talk \| contribs) DCH-Employees-701 2,257 edits →HEIMAP ← Older edit		Revision as of 12:27, 22 June 2015 view source Tigre (talk \| contribs) DCH-Employees-701 2,257 edits →HEIMAP Newer edit →
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	#Save the condition file by clicking 'Save/Edit Parameter...'. Click 'Acquisition of latest status' to the right and (after the parameters appear in the window) click 'Apply/Save'. Note in the status line that the condition file has been saved.		#Save the condition file by clicking 'Save/Edit Parameter...'. Click 'Acquisition of latest status' to the right and (after the parameters appear in the window) click 'Apply/Save'. Note in the status line that the condition file has been saved.

	= Exposure of mgn-files =		= Exposure of mgn-files =