Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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'''Create sdf and jdf-files:''' | '''Create sdf and jdf-files:''' | ||
# | #download [http://download.cnet.com/SuperEdi/3000-2352_4-10291091.html SuperEdi], | ||
# | #read the sdf and jdf-file manual found [[Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation|here]], | ||
# | #find templates of sdf and jdf files on the cleanroom drive in the folder E-beam sdf and jdf templates. | ||
# Assist a fully trained colleague of yours when she or he e-beam writes, gather as much knowledge about your e-beam run, i.e. which e-beam current, aperture and dose to use, which shot pitch (e.g. SHOT A,10). | |||
''' Gather Experience ''' | |||
#Assist a fully trained colleague of yours when she or he e-beam writes, gather as much knowledge about your e-beam run, i.e. which e-beam current, aperture and dose to use, which shot pitch (e.g. SHOT A,10). | |||
# Study the logbook for the e-beam writer: sheet 1 gives you an overview of which condition files (currents and apertures) have been in use recently by which user on which type of resist. On sheet 2 in this logbook you can find a writing time estimation program. | # Study the logbook for the e-beam writer: sheet 1 gives you an overview of which condition files (currents and apertures) have been in use recently by which user on which type of resist. On sheet 2 in this logbook you can find a writing time estimation program. | ||
# Study | # Study the manual for the machine, it can be found [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=292 here] | ||
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