Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions
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'''If your pattern is larger than one field size''', it will be stitched by several fields. In the tab 'Multipass', you can choose to smooth the stitching errors by overlapping the fields to be stitched or by multipass method. | '''If your pattern is larger than one field size''', it will be stitched by several fields. In the tab 'Multipass', you can choose to smooth the stitching errors by overlapping the fields to be stitched or by multipass method. | ||
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The multipass method smooths the pattern writing over many fields, each field writing the pattern with e.g. half the dose in different areas of the main deflector; this is however not recommended for field sizes larger than 500 mm x 500 mm, as the distorion of the main deflector using larger field sizes may be larger than the stitching errors of two fields. | The multipass method smooths the pattern writing over many fields, each field writing the pattern with e.g. half the dose in different areas of the main deflector; this is however not recommended for field sizes larger than 500 mm x 500 mm, as the distorion of the main deflector using larger field sizes may be larger than the stitching errors of two fields. | ||
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