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Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions

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[[File:beamer1.jpg|400px|right]]
[[File:beamer1.jpg|400px|right]]
# Import a GDSII-file by dragging the 'Import' module to the process flow area. Select the file. In the 'Import Layout' window, type the layer number to import or type * if you wish to import all layers.
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[[File:beamer2.jpg|400px|right]]
[[File:beamer2.jpg|400px|right]]


[[File:beamer3.jpg|400px|right]]


# Import a GDSII-file by dragging the 'Import' module to the process flow area. Select the file. In the 'Import Layout' window, type the layer number to import or type * if you wish to import all layers.
# Export the GDSII file to v30 by dragging an 'Export' module on top of the 'Import' icon. An 'Export JEOL' window appears.  
# Export the GDSII file to v30 by dragging an 'Export' module on top of the 'Import' icon. An 'Export JEOL' window appears.  
# In the tab 'General' of this export window, choose JBX9300FS (100kV).
# In the tab 'General' of this export window, choose JBX9300FS (100kV).
# In the tab 'Advanced', type the correct field size (maximum is 1000 mm in both X and Y). The fields will be distributed automatically by choosing 'Fixed'. In case you have small patterns, is it recommended to tick 'Center to Field'.
# In the tab 'Advanced', type the correct field size (maximum is 1000 mm in both X and Y). The fields will be distributed automatically by choosing 'Fixed'. In case you have small patterns, is it recommended to tick 'Center to Field'.
[[File:beamer3.jpg|400px|right]]




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interleaving with extra field: the overlap will be finger-jointed by field 1, field 2 and an extra field 3, as illustrated below in figure c.
interleaving with extra field: the overlap will be finger-jointed by field 1, field 2 and an extra field 3, as illustrated below in figure c.


The multipass method smooths the pattern writing over many fields, each field writing the pattern with e.g. half the dose in different areas of the main deflector; this is however not recommended for field sizes larger than 500 mm x 500 mm, as the distorion of the main deflector using larger field sizes may be larger than the stitching errors of two fields.


 
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The multipass method smooths the pattern writing over many fields, each field writing the pattern with e.g. half the dose in different areas of the main deflector; this is however not recommended for field sizes larger than 500 mm x 500 mm, as the distorion of the main deflector using larger field sizes may be larger than the stitching errors of two fields.


=Dose variations=
=Dose variations=
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