Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions

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 # Export the GDSII file to v30 by dragging an 'Export' module on top of the 'Import' icon. An 'Export JEOL' window appears.
 # In the tab 'General' of this export window, choose JBX9300FS (100kV).
+# In the tab 'Advanced', type the correct field size (maximum is 1000 mm in both X and Y). The fields will be distributed automatically by choosing 'Fixed'. In case you have small patterns, is it recommended to tick 'Center to Field'.
 [[File:beamer3.jpg|400px|right]]
-# In the tab 'Advanced', type the correct field size (maximum is 1000 mm in both X and Y). The fields will be distributed automatically by choosing 'Fixed'. In case you have small patterns, is it recommended to tick 'Center to Field'.
-# If your pattern is larger than one field size, it will be stitched by several fields. In the tab 'Multipass', you can choose to smooth the stitching errors by overlapping the fields to be stitched or by multipass
+'''If your pattern is larger than one field size'', it will be stitched by several fields. In the tab 'Multipass', you can choose to smooth the stitching errors by overlapping the fields to be stitched or by multipass
 There are 3 types of overlap methods, in all 3 methods you define an overlap width;