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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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|Thermal SiO2
|Thermal SiO2
|-  
|-  
|rowspan="7" valign="top"|[[Specific Process Knowledge/Thin film deposition| Thin film deposition]]
|rowspan="8" valign="top"|[[Specific Process Knowledge/Thin film deposition| Thin film deposition]]
|Sputter deposition
|Sputter deposition
|Metals: Al, Ti, Cr, Co, Ni, Cu, Mo, Pd, Ag, Sn, Ta, W, Pt, Au, Fe, Mg, Nb, Ru <br>
|Metals: Al, Ti, Cr, Co, Ni, Cu, Mo, Pd, Ag, Sn, Ta, W, Pt, Au, Fe, Mg, Nb, Ru <br>
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