Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 320: | Line 320: | ||
|- align="center" | |- align="center" | ||
| 2" Ti cassette || 2" Al cassette || 4" Ti cassette || 42 Al cassette | | 2" Ti cassette || 2" Al cassette || 4" Ti cassette || 42 Al cassette | ||
|} | |||
= Alignment of exposure to existing pattern on wafer = | = Alignment of exposure to existing pattern on wafer = | ||