Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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= Mount = | |||
{| cellpadding="2" style="border: 2px solid darkgray;" align="right" | |||
! width="150" | | |||
! width="150" | | |||
! width="150" | | |||
! width="250" | | |||
! width="200" | | |||
|- border="0" | |||
| [[File:IMG_6433.jpg|400px]][[File:IMG_6434.jpg|400px]] | |||
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|- align="center" | |||
| 2" Ti cassette || 2" Al cassette || 4" Ti cassette || 42 Al cassette | |||
= Alignment of exposure to existing pattern on wafer = | = Alignment of exposure to existing pattern on wafer = | ||