Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions
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The MULTI-function additionally shifts the field positions, in order to smear out stitching errors: | The MULTI-function additionally shifts the field positions, in order to smear out stitching errors: | ||
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!command | |||
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!MULTI, n | |||
!MULTI/FP | |||
!OVERLAP,n | |||
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|Specifies execution of the field shift overlap writing mode. In this mode, overlap pattern writing is performed n times, applying one nth of the normal e-beam dose, by changing the writing position on the writing fields of pattern data. | |||
|Carries out the field shift overlap writing for the entire chip, in order from the first overlap, without mixing the writing fields of different overlaps. | |||
|Specifies execution of the overlap writing mode. In this mode, overlap pattern writing is performed n times, applying one nth of the normal e-beam dose on the writing fields of pattern data. | |||
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= Compiling to mgn = | = Compiling to mgn = | ||