Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions
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== MULTIPASS and OVERLAP == | |||
When defining the v30-file to be exposed, e.g. | |||
P(3) 'resolution3.v30' | |||
either a multipass or overlap function can be added, e.g. | |||
P(3) 'resolution3.v30',OVERLAP,2 | |||
In this case, each field of pattern data is written twice with half the dose. This is suitable if you expose delicate structures on a resist that tends to overheat. | |||
The MULTI-function additionally shifts the field positions, in order to smear out stitching errors: | |||
<pre> | |||
command | |||
MULTI,n Specifies execution of the field shift overlap writing mode. In this mode, overlap pattern writing is performed n times, applying one nth of the normal e-beam dose, by changing the writing position on the writing fields of pattern data. | |||
MULTI/FP Carries out the field shift overlap writing for the entire chip, in order from the first overlap, without mixing the writing fields of different overlaps. | |||
OVERLAP,n Specifies execution of the overlap writing mode. In this mode, overlap pattern writing is performed n times, applying one nth of the normal e-beam dose on the writing fields of pattern data. | |||
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