Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions

← Older edit Newer edit →

VisualWikitext

@@ Line 119: / Line 119: @@
 ___________________________________________________________________________
-=== Examples ===
-{| class="wikitable collapsible autocollapse"
-! 20 coloums of chips on a wafer; the first 10 coloums of the array is exposed with one shot pitch, the rest of the chips with another.
-|-
-!colspan="2"| An array of 20 chips is written on one 4" wafer. The first 10 coloums of the array is defined in layer block no. 1 of the jdf, coloumn 11-20 is defined in layer block no. 2 of the jdf. The two layer blocks uses different beam shot pitch and base dose. The two layer blocks must be called in two different sequences in the sdf-file.
-|-
-|-
-|
-SDF file
-<pre>
-MAGAZIN 'LAYERS'
-#1
-%4A
-JDF     'layers',1
-ACC 100
-CALPRM '0.2na_ap5'
-DEFMODE 2
-OFFSET(0,0)
-#1
-%4A
-JDF     'layers',2
-ACC 100
-CALPRM '0.2na_ap5'
-DEFMODE 2
-OFFSET(0,0)
-END 1
-</pre>
-JDF FILE
-<pre>
-JOB/W  'TWOLAYERS',4
-PATH DRF5M
-ARRAY   (-10000,20,2000)/( 10000,20,2000)
-  ASSIGN  P(1) -> (1-10,*)
-  ASSIGN  P(2) -> (11-20,*)
-AEND
-PEND
-LAYER   1
-P( 1 )  'test2.v30'
-SPPRM 4.0,,,,1.0,1
-SHOT A,20
-RESIST 220
-STDCUR  0.22 ;nA
-LAYER   2
-P( 2 )  'test2.v30'
-SPPRM 4.0,,,,1.0,1
-SHOT A,40
-RESIST 250
-STDCUR  0.22 ;nA
-END
-</pre>
-|-
-|}
@@ Line 466: / Line 398: @@
 When the pattern is accepted by user, the e-beam exposure can start.
+=== Examples ===
+{| class="wikitable collapsible autocollapse"
+! 20 coloums of chips on a wafer; the first 10 coloums of the array is exposed with one shot pitch, the rest of the chips with another.
+|-
+!colspan="2"| An array of 20 chips is written on one 4" wafer. The first 10 coloums of the array is defined in layer block no. 1 of the jdf, coloumn 11-20 is defined in layer block no. 2 of the jdf. The two layer blocks uses different beam shot pitch and base dose. The two layer blocks must be called in two different sequences in the sdf-file.
+|-
+|-
+|
+SDF file
+<pre>
+MAGAZIN 'LAYERS'
+#1
+%4A
+JDF     'layers',1
+ACC 100
+CALPRM '0.2na_ap5'
+DEFMODE 2
+OFFSET(0,0)
+#1
+%4A
+JDF     'layers',2
+ACC 100
+CALPRM '0.2na_ap5'
+DEFMODE 2
+OFFSET(0,0)
+END 1
+</pre>
+JDF FILE
+<pre>
+JOB/W  'TWOLAYERS',4
+PATH DRF5M
+ARRAY   (-10000,20,2000)/( 10000,20,2000)
+  ASSIGN  P(1) -> (1-10,*)
+  ASSIGN  P(2) -> (11-20,*)
+AEND
+PEND
+LAYER   1
+P( 1 )  'test2.v30'
+SPPRM 4.0,,,,1.0,1
+SHOT A,20
+RESIST 220
+STDCUR  0.22 ;nA
+LAYER   2
+P( 2 )  'test2.v30'
+SPPRM 4.0,,,,1.0,1
+SHOT A,40
+RESIST 250
+STDCUR  0.22 ;nA
+END
+</pre>
+|-
+|}