Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions
| Line 283: | Line 283: | ||
note 1: Width, length, type and orientation of global marks (GLMP) or chipmarks (CHMARK); the settings of the parameters t (type) and f (orientation) are listed in the two tables below: | note 1: Width, length, type and orientation of global marks (GLMP) or chipmarks (CHMARK); the settings of the parameters t (type) and f (orientation) are listed in the two tables below: | ||
[[File:marktype.jpg|500px]] | |||
[[File:markorientation.jpg|500px]] | |||