Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions
| Line 133: | Line 133: | ||
MAGAZIN 'LAYERS' | MAGAZIN 'LAYERS' | ||
#1 | #1 | ||
%4A | %4A | ||
JDF 'layers',1 | JDF 'layers',1 | ||
ACC 100 | ACC 100 | ||
CALPRM '0.2na_ap5' | CALPRM '0.2na_ap5' | ||
DEFMODE 2 | DEFMODE 2 | ||
OFFSET(0,0) | OFFSET(0,0) | ||
#1 | #1 | ||
%4A | %4A | ||
JDF 'layers',2 | JDF 'layers',2 | ||
ACC 100 | ACC 100 | ||
CALPRM '0.2na_ap5' | CALPRM '0.2na_ap5' | ||
DEFMODE 2 | DEFMODE 2 | ||
OFFSET(0,0) | OFFSET(0,0) | ||
END 1 | |||
</pre> | </pre> | ||
| Line 173: | Line 158: | ||
PATH DRF5M | PATH DRF5M | ||
ARRAY (-10000,20,2000)/( 10000,20,2000) | ARRAY (-10000,20,2000)/( 10000,20,2000) | ||
ASSIGN P(1) -> (1-10,*) | |||
ASSIGN P(2) -> (11-20,*) | |||
ASSIGN P(1) -> (1-10,*) | |||
ASSIGN P(2) -> (11-20,*) | |||
AEND | AEND | ||
PEND | PEND | ||
LAYER 1 | LAYER 1 | ||
P( 1 ) 'test2.v30' | P( 1 ) 'test2.v30' | ||
SPPRM 4.0,,,,1.0,1 | SPPRM 4.0,,,,1.0,1 | ||
SHOT A,20 | SHOT A,20 | ||
RESIST 220 | RESIST 220 | ||
STDCUR 0.22 ;nA | STDCUR 0.22 ;nA | ||
LAYER 2 | LAYER 2 | ||
P( 2 ) 'test2.v30' | P( 2 ) 'test2.v30' | ||
SPPRM 4.0,,,,1.0,1 | SPPRM 4.0,,,,1.0,1 | ||
SHOT A,40 | SHOT A,40 | ||
RESIST 250 | RESIST 250 | ||
STDCUR 0.22 ;nA | |||
END | END | ||
</pre> | </pre> | ||