Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions
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! | ! 20 coloums of chips on a wafer; the first 10 coloums of the array is exposed with one shot pitch, the rest of the chips with another. | ||
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!colspan="2"| An array of 20 chips is written on one 4" wafer. The first 10 coloums of the array is defined in layer block no. 1 of the jdf, coloumn 11-20 is defined in layer block no. 2 of the jdf. The two layer blocks uses different beam shot pitch and base dose. The two layer blocks must be called in two different sequences in the sdf-file. | !colspan="2"| An array of 20 chips is written on one 4" wafer. The first 10 coloums of the array is defined in layer block no. 1 of the jdf, coloumn 11-20 is defined in layer block no. 2 of the jdf. The two layer blocks uses different beam shot pitch and base dose. The two layer blocks must be called in two different sequences in the sdf-file. | ||