Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions
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MAGAZIN 'LAYERS' | MAGAZIN 'LAYERS' | ||
#1 | #1 | ||
| Line 163: | Line 162: | ||
END 1 | END 1 | ||
JOB/W 'TWOLAYERS',4 | |||
JOB/W 'TWOLAYERS',4 | |||
PATH DRF5M | PATH DRF5M | ||
ARRAY (-10000,20,2000)/( 10000,20,2000) | ARRAY (-10000,20,2000)/( 10000,20,2000) | ||
ASSIGN P(1) -> (1-10,*) | ASSIGN P(1) -> (1-10,*) | ||
ASSIGN P(2) -> (11-20,*) | ASSIGN P(2) -> (11-20,*) | ||
AEND | AEND | ||
PEND | PEND | ||
LAYER 1 | LAYER 1 | ||
P( 1 ) 'test2.v30' | P( 1 ) 'test2.v30' | ||
SPPRM 4.0,,,,1.0,1 | SPPRM 4.0,,,,1.0,1 | ||
SHOT A,20 | SHOT A,20 | ||
RESIST 220 | RESIST 220 | ||
STDCUR 0.22 ;nA | STDCUR 0.22 ;nA | ||
LAYER 2 | |||
P( 2 ) 'test2.v30' | P( 2 ) 'test2.v30' | ||
SPPRM 4.0,,,,1.0,1 | SPPRM 4.0,,,,1.0,1 | ||
SHOT A,40 | SHOT A,40 | ||
RESIST 250 | RESIST 250 | ||
STDCUR 0.22 ;nA | STDCUR 0.22 ;nA | ||