Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions
| Line 130: | Line 130: | ||
MAGAZIN 'LAYERS' | MAGAZIN 'LAYERS' | ||
; THIS IS FOR WAFER #1 %4A | ; THIS IS FOR WAFER #1 %4A | ||
#1 | #1 | ||
%4A | %4A | ||
JDF 'layers',1 | JDF 'layers',1 | ||
ACC 100 | ACC 100 | ||
CALPRM '0.2na_ap5' | CALPRM '0.2na_ap5' | ||
DEFMODE 2 | |||
DEFMODE 2 | |||
OFFSET(0,0) | OFFSET(0,0) | ||
#1 | #1 | ||
%4A | %4A | ||
JDF 'layers',2 | JDF 'layers',2 | ||
ACC 100 | ACC 100 | ||
CALPRM '0.2na_ap5' | CALPRM '0.2na_ap5' | ||
DEFMODE 2 | |||
DEFMODE 2 | |||
OFFSET(0,0) | OFFSET(0,0) | ||
END 1 | END 1 | ||