Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions
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= Preparing a GDS file = | = Preparing a GDS file = | ||
If the layout | If the layout is asymmetric, the conversion might result in an offset of the final layout onto the wafer. It is therefore recommended to symmetrise the layout, e.g. by inserting small structures in the corners of a rectangle that covers the layout. | ||
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Even though you do not export hidden layers or un-selected cells, unwanted layers might appear in the final GDSII file. Therefore, after conversion til GDSII, check your layout in a different layout viewer, e.g. CleWin (freeware), or BEAMER. | Even though you do not export hidden layers or un-selected cells, unwanted layers might appear in the final GDSII file. Therefore, after conversion til GDSII, check your layout in a different layout viewer, e.g. CleWin (freeware), or BEAMER. | ||
= Converting from GDS to v30 (BEAMER)= | = Converting from GDS to v30 (BEAMER)= | ||