Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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For safety reasons, even fully trained users are only authorized to mount substrates into the e-beam cassettes, but not authorized to load the cassettes into the autoloader. | For safety reasons, even fully trained users are only authorized to mount substrates into the e-beam cassettes, but not authorized to load the cassettes into the autoloader. | ||
To use the e-beam writer, book the machine via LabManager, '''note the number and type of substrate as well as the condition file to be used in the 'Public Comment:' field in LabManager'''. Mount your substrate in the cassette | To use the e-beam writer, book the machine via LabManager, '''note the number and type of substrate as well as the condition file to be used in the 'Public Comment:' field in LabManager'''. Mount your substrate in the cassette and pre-align if necessary. Call for help from DTU Danchip staff to load your cassette into the robot loader (the autoloader). | ||
After your exposure, fully trained users can unload their cassettes from the autoloader, unmount their substrates and re-load an '''empty''' cassette into the autoloader. | After your exposure, fully trained users can unload their cassettes from the autoloader, unmount their substrates and re-load an '''empty''' cassette into the autoloader. | ||
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* A jdf-, and sdf-file manual describing how to prepare sdf-, and jdf-files (found under 'Technical Documents') | * A jdf-, and sdf-file manual describing how to prepare sdf-, and jdf-files (found under 'Technical Documents') | ||
* A BEAMER manual describing how to convert your pattern file (GDSII-format) to v30-format (found under 'Technical Documents')''' | * A BEAMER manual describing how to convert your pattern file (GDSII-format) to v30-format (found under 'Technical Documents')''' | ||