Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions
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==Cleaning of wafers or masks== | ==Cleaning of wafers or masks== | ||
Cleaning of wafers or masks with sulphuric acid can be done either in a dedicated tank "7-up" or in the fumehood in a beaker "Piranha" | Cleaning of wafers or masks with sulphuric acid can be done either in a dedicated tank "7-up" or in the fumehood in a beaker "Piranha" | ||
Both 7-up and Piranha removes heavy organics. | Both 7-up and Piranha removes heavy organics. | ||
Always use one of these after KOH to remove alkali ions before further processing. 7-up and Piranha are also used as cleaning solutions after stripping resist. | Always use one of these after KOH to remove alkali ions before further processing. 7-up and Piranha are also used as cleaning solutions after stripping resist. | ||
[[Image:7-up_RR3.jpg|300x300px|right|thumb|7-up in cleanroom 3]] | |||
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! 7-up | ! 7-up | ||
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[[Image:7-up_RR4.JPG|300x300px|right|thumb|7-up in cleanroom 3]] | |||