Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/nano/Sinan37: Difference between revisions
Appearance
Created page with "{| {{table}} | align="center" style="background:#f0f0f0;"|'''Nominal trench line width''' | align="center" style="background:#f0f0f0;"|'''''' | align="center" style="backgroun..." |
No edit summary |
||
| Line 1: | Line 1: | ||
<!-- revised 1/6-2015 by jmli --> | |||
{| {{table}} | {| {{table}} | ||
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width''' | | align="center" style="background:#f0f0f0;"|'''Nominal trench line width''' | ||