Specific Process Knowledge/Etch/ICP Metal Etcher/Aluminium: Difference between revisions
No edit summary |
|||
| Line 113: | Line 113: | ||
|~282 nm/min (depending on features size and etch load) | |~282 nm/min (depending on features size and etch load) | ||
|} | |} | ||
[[Media:Al-etch.pdf|Al Etch Information (supplied from STS)]]. | |||