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Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
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!Comments
!Comments
|-
|-
|-
|-style="background:WhiteSmoke; color:black"
|Si with native oxide
|79.3°
|22/5 2015
|taran
|average of three measurements on one sample


|-
|-
Line 78: Line 86:
|taran
|taran
|average of nine measurements (three measurements on three different samples)
|average of nine measurements (three measurements on three different samples)
|-
|-style="background:WhiteSmoke; color:black"
|Si with native oxide
|79.3°
|22/5 2015
|taran
|average of three measurements on one sample


|-
|-
Line 114: Line 114:
!Comments
!Comments
|-
|-
|-
|-style="background:WhiteSmoke; color:black"
|Si with native oxide
|72.8°
|22/5 2015
|taran
|average of three measurements on one sample


|-
|-
Line 122: Line 130:
|taran
|taran
|average of nine measurements (three measurements on three different samples)
|average of nine measurements (three measurements on three different samples)
|-
|-style="background:WhiteSmoke; color:black"
|Si with native oxide
|72.8°
|22/5 2015
|taran
|average of three measurements on one sample


|-
|-
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