Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions

@@ Line 55: / Line 55: @@
 ''Flow names, process parameters, and test results:''
 *'''(0001) HMDS Standard'''
-VPO temperature: 120°C
+VPO temperature: 120°C <br>
 Process parameters: 30s vacuum bake @ -0.67 bar, HMDS injection, 90s reaction @ -0.28 bar, 20s cooling @ 21°C.
@@ Line 99: / Line 99: @@
 *''' (0002) HMDS fast'''
-Process parameters: 10s contact bake, 30s vacuum bake, 72s HMDS priming, 5s cooling.
+VPO temperature: 120°C <br>
+Process parameters: 30s vacuum bake @ -0.67 bar, HMDS injection, 15s reaction @ -0.28 bar, 20s cooling @ 21°C.
 Test results:
@@ Line 117: / Line 118: @@
 |-style="background:WhiteSmoke; color:black"
 |110 nm oxide
-|82.0°
+|
-|7/5 2013
+|
 |taran
-|average of three measurements on one sample
+|average of nine measurements (three measurements on three different samples)
 |-
 |-style="background:WhiteSmoke; color:black"
 |Si with native oxide
-|73.3°
+|72.8°
-|7/5 2013
+|22/5 2015
 |taran
-|average of nine measurements (three measurements on three different samples)
+|average of three measurements on one sample
 |-
 |-style="background:WhiteSmoke; color:black"
 |Borofloat (glass)
-|65.6°
+|
-|7/5 2013
+|
 |taran
 |average of three measurements on one sample