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Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 55: Line 55:
''Flow names, process parameters, and test results:''
''Flow names, process parameters, and test results:''
*'''(0001) HMDS Standard'''
*'''(0001) HMDS Standard'''
Process parameters: 10s contact bake, 30s vacuum bake, 72s HMDS priming, 5s cooling.
VPO temperature: 120°C
Process parameters: 30s vacuum bake @ -0.67 bar, HMDS injection, 90s reaction @ -0.28 bar, 20s cooling @ 21°C.


Test results:
Test results:
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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|110 nm oxide
|110 nm oxide
|82.0°
|
|7/5 2013
|
|taran
|taran
|average of three measurements on one sample
|average of nine measurements (three measurements on three different samples)


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Si with native oxide
|Si with native oxide
|73.3°
|79.3°
|7/5 2013
|22/5 2015
|taran
|taran
|average of nine measurements (three measurements on three different samples)
|average of three measurements on one sample


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Borofloat (glass)
|Borofloat (glass)
|65.6°
|
|7/5 2013
|
|taran
|taran
|average of three measurements on one sample
|average of three measurements on one sample
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