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Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 54: Line 54:


''Flow names, process parameters, and test results:''
''Flow names, process parameters, and test results:''
*'''HMDS Standard'''
*'''(0001) HMDS Standard'''
Process parameters: 10s contact bake, 30s vacuum bake, 72s HMDS priming, 5s cooling.
Process parameters: 10s contact bake, 30s vacuum bake, 72s HMDS priming, 5s cooling.


Line 97: Line 97:




*'''HMDS fast'''
*''' (0002) HMDS fast'''
Process parameters: 10s contact bake, 30s vacuum bake, 72s HMDS priming, 5s cooling.
Process parameters: 10s contact bake, 30s vacuum bake, 72s HMDS priming, 5s cooling.


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