Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions

@@ Line 409: / Line 409: @@
 |-style="background:WhiteSmoke; color:black"
 |Silicon with native oxide
-|4.194 µm
+|4.171 µm
-|0.5%
+|0.7%
 |20/3 2015
 |taran
-|6" wafer, no HMDS. 13 points on one wafer, exclusion zone 5mm
+|4" wafer, no HMDS. 9 points on one wafer, exclusion zone 5mm
 |-
 |-style="background:WhiteSmoke; color:black"
 |Silicon with native oxide
-|4.171 µm
+|4.194 µm
-|0.7%
+|0.5%
 |20/3 2015
 |taran
-|4" wafer, no HMDS. 9 points on one wafer, exclusion zone 5mm
+|6" wafer, no HMDS. 13 points on one wafer, exclusion zone 5mm
 |}