Jump to content

Specific Process Knowledge/Etch/ICP Metal Etcher/Barc Etch: Difference between revisions

← Older editNewer edit →
VisualWikitext
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
Line 26: Line 26:
! Results
! Results
|-  
|-  
|Etch rate in barc||52nm in 30s ''[bghe 20150519]''
|Etch rate in barc||'''52nm in 30s''' ''[bghe 20150519]''
|-
|-
|Etch rate in KRF resist||27 nm in 30s ''[bghe 20150519]''
|Etch rate in KRF resist||'''27 nm in 30s''' ''[bghe 20150519]''
|-  
|-  
|Selectivity KRF:Barc||1:2  
|Selectivity KRF:Barc||'''1:2'''
|-
|-
|Etch 65nm barc||Use 40-45s
|Etch 65nm barc||'''Use 40-45s'''
|-
|-
|}
|}
<br/>
<br/>
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/Barc_Etch"