Specific Process Knowledge/Etch/ICP Metal Etcher/Barc Etch: Difference between revisions
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Etching barc with a dedicated recipe for barc etching is a good idea if you are on the limit of having enough DUV resist mask to reach etch depth you need.Here is an example of a barc etch I have started testing. | Etching barc with a dedicated recipe for barc etching is a good idea if you are on the limit of having enough DUV resist mask to reach etch depth you need.Here is an example of a barc etch I have started testing. | ||
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! Parameter | |||
! Settings | |||
|- | |||
|Coil power||800W | |||
|- | |||
|Platen power||100W | |||
|- | |||
|Pressure||3 mTorr | |||
|- | |||
|Flow rate CF4||4 sccm | |||
|- | |||
|Flow rate H2||20sccm | |||
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{| border="1" cellspacing="1" cellpadding="2" align="left" | |||
! Parameter | |||
! Results | |||
|- | |||
|Etch rate in barc||52nm in 30s | |||
|- | |||
|Etch rate in KRF resist||27 nm in 30s | |||
|- | |||
|Selectivity KRF:Barc||1:2 | |||
|- | |||
|Etch 65nm barc||Use 40-45s | |||
|- | |||
|} | |||
<br/> | |||
Revision as of 12:22, 19 May 2015
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Barc Etch
Etching barc with a dedicated recipe for barc etching is a good idea if you are on the limit of having enough DUV resist mask to reach etch depth you need.Here is an example of a barc etch I have started testing.
| Parameter | Settings |
|---|---|
| Coil power | 800W |
| Platen power | 100W |
| Pressure | 3 mTorr |
| Flow rate CF4 | 4 sccm |
| Flow rate H2 | 20sccm |
| Parameter | Results |
|---|---|
| Etch rate in barc | 52nm in 30s |
| Etch rate in KRF resist | 27 nm in 30s |
| Selectivity KRF:Barc | 1:2 |
| Etch 65nm barc | Use 40-45s |