Specific Process Knowledge/Characterization/Element analysis: Difference between revisions

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 === Typical application of SIMS ===
-SIMS is the most sensitive technique for elemental composition. It is therefore ideal if you want to check for a contamination.
+SIMS is the most sensitive technique for elemental composition. It is therefore ideal if you want to check doping profiles or for contaminations.
-A typical application would be to to check if a metal free chamber had been contaminated with, say, gold. In that case one would put three samples into the SIMS.
-* A bulk gold sample
-* A pristine wafer that has been processed in the contaminated chamber.
-* A clean sample that has definitely not been contaminated: A pristine wafer
-All three samples are then exposed to the caesium beam and the count rate at the mass 196 atomic units (gold) is compared.
+A typical application would be to check the concentration profile of boron doping in silicon. In that case one would put two samples into the SIMS.
+* A reference sample with a known boron profile
+* A sample
 == X-ray Photoelectron Spectroscopy analysis (XPS) ==