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Specific Process Knowledge/Characterization/Sample preparation: Difference between revisions

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:Post process: O2 Plasma Ashing 10 min
:Post process: O2 Plasma Ashing 10 min
{| border="1" cellspacing="1" cellpadding="1" align="middle"
{| border="1" cellspacing="1" cellpadding="1" align="middle"
![[image:FRSTO 1umSiO2 AOE 1 Top C6 L9 16.jpg|300x300px|thumb|left|
![[image:StackedSlices.jpg|300x300px|thumb|left|
  Bird View. Dark area is Silicon. Bright area is Silicon Dioxide. The edges are nicely defined, though corrugated on the 100 nm scale.
  Bird View. Dark area is Silicon. Bright area is Silicon Dioxide. The edges are nicely defined, though corrugated on the 100 nm scale.
]]
]]