Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE blazed gratings: Difference between revisions
| Line 5: | Line 5: | ||
<gallery widths="300px" heights="250px"> | <gallery widths="300px" heights="250px"> | ||
Image:IBE 30min -Cr1.jpg |30min etch with 100nm Cr mask | Image:IBE 30min -Cr1.jpg |30min etch with 100nm Cr mask, used recipe BGHE blazed gratings with CHF3 | ||
Image:after IBE 45min_A_34.jpg |45min etch with 100nm Cr mask | Image:after IBE 45min_A_34.jpg |45min etch with 100nm Cr mask, used recipe BGHE blazed gratings with CHF3 | ||
Image:Edge_1.jpg|20min etch with Krf resist, all resist is gone | Image:Edge_1.jpg|20min etch with Krf resist, all resist is gone, used recipe BGHE blazed gratings | ||
Image:15min+30min5.jpg|15+30min etch with 50nm Cr mask | Image:15min+30min5.jpg|15+30min etch with 50nm Cr mask, used recipe BGHE blazed gratings with CHF3 | ||
</gallery> | </gallery> | ||
Revision as of 11:58, 12 May 2015
Feedback to this page: click here
THIS PAGE IS UNDER CONSTRUCTION
-
30min etch with 100nm Cr mask, used recipe BGHE blazed gratings with CHF3 -
45min etch with 100nm Cr mask, used recipe BGHE blazed gratings with CHF3 -
20min etch with Krf resist, all resist is gone, used recipe BGHE blazed gratings -
15+30min etch with 50nm Cr mask, used recipe BGHE blazed gratings with CHF3
