Jump to content

Specific Process Knowledge/Thin Film deposition/ALD/TiO2 deposition using ALD: Difference between revisions

← Older editNewer edit →
VisualWikitext
Pevo (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
2,331 edits
No edit summary
Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
No edit summary
Line 43: Line 43:
<gallery caption="Titanium dioxide thickness as function of number of cycles" widths="300px" heights="300px" perrow="5">
<gallery caption="Titanium dioxide thickness as function of number of cycles" widths="300px" heights="300px" perrow="5">
image:ALD_TiO2_grow_rate_150C.jpg| Temperature 150 <sup>o</sup>C.
image:ALD_TiO2_grow_rate_150C.jpg| Temperature 150 <sup>o</sup>C.
image:ALD_TiO2_grow_rate_250C.jpg| Temperature 200 <sup>o</sup>C.
image:ALD_TiO2_grow_rate_250C.jpg| Temperature 250 <sup>o</sup>C.
image:ALD_TiO2_grow_rate_350C.jpg| Temperature 250 <sup>o</sup>C.
image:ALD_TiO2_grow_rate_350C.jpg| Temperature 350 <sup>o</sup>C.
</gallery>
</gallery>


Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_Film_deposition/ALD/TiO2_deposition_using_ALD"