Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions
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==HMDS priming== | ==HMDS priming== | ||
The standard HMDS priming process has been developed to mimic the behavior of the IMTEC Star2000 HMDS oven. | The standard HMDS priming process has been developed to mimic the behavior of the IMTEC Star2000 HMDS oven. | ||
It produces a contact angle of 81-82° on an oxidized silicon surface. General information on HMDS priming can be found [[Specific_Process_Knowledge/Lithography/Coaters/ | It produces a contact angle of 81-82° on an oxidized silicon surface. General information on HMDS priming can be found [[Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_Gamma_UV_processing#HMDS priming|here]]. | ||
''Flow names, process parameters, and test results:'' | ''Flow names, process parameters, and test results:'' | ||