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Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions

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''Flow names, process parameters, and test results:''
''Flow names, process parameters, and test results:''
*'''T1 T2 HMDS Standard'''
*'''HMDS fast'''
Process parameters: 10s contact bake, 30s vacuum bake, 72s HMDS priming, 5s cooling.
Process parameters: 10s contact bake, 30s vacuum bake, 72s HMDS priming, 5s cooling.


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|taran
|taran
|average of three measurements on one sample
|average of three measurements on one sample
|}
*'''HMDS Standard'''
Process parameters: 10s contact bake, 30s vacuum bake, 72s HMDS priming, 5s cooling.
Test results:
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!Substrate
!Contact angle
!Test date
!Tester initials
!Comments
|-


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|3 µm oxide
|110 nm oxide
|81.
|82.
|12/6 2013
|7/5 2013
|taran
|taran
|
|average of three measurements on one sample


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|15 µm oxide
|Si with native oxide
|68-70°
|73.3°
|20/6 2013
|7/5 2013
|taran
|taran
|dehydrated 1 hour at 250°C
|average of nine measurements (three measurements on three different samples)


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|15 µm oxide
|Borofloat (glass)
|71°
|65.6°
|21/6 2013
|7/5 2013
|taran
|taran
|dehydrated 18 hours at 250°C
|average of three measurements on one sample


|}
|}