Specific Process Knowledge/Back-end processing/Disco Saw: Difference between revisions
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== | ==Comparing dicing parameters for different materials== | ||
{| border="2" cellspacing="0" cellpadding="4" align="center" | |||
! | |||
!FilmTek 4000 | |||
!Ellipsometer | |||
|- valign="top" | |||
|'''Method''' | |||
|Reflection | |||
|Ellipsometry | |||
|-valign="top" | |||
|'''General description''' | |||
|Thin films up to 250 µm, Especially good for thick thin films and for wafer mapping | |||
|Good for very thin films down to a few Å | |||
|-valign="top" | |||
|'''Film thickness range''' | |||
|<250 µm (for silicon oxides > ~75nm) | |||
|20 Å to ~2µm (for silicon oxide) | |||
|-valign="top" | |||
|'''Film thickness accuracy''' | |||
|Very dependent of how good the model fits (if the fit is good it could be within 1% for a single layer) | |||
|Very dependent of how good the model fits. | |||
|-valign="top" | |||
|'''Index range''' | |||
|not any limits | |||
|not any limits | |||
|-valign="top" | |||
|'''Index accuracy''' | |||
|not known | |||
|not known | |||
|- valign="top" | |||
|'''Wavelength range''' | |||
|400-1000 nm | |||
|300-950 nm | |||
|-valign="top" | |||
|'''What kind of thin films can be measured''' | |||
|Any film that is transparent to the light in the given wavelength range | |||
ex: | |||
*Silicon Oxide | |||
*Silicon nitride | |||
*PolySilicon | |||
*Photoresists | |||
*SU8 | |||
*Other polymers | |||
*Very thin layers of metals (<20 nm) | |||
*and many more | |||
|Any film that is transparent to the light in the given wavelength range | |||
ex: | |||
*Silicon Oxide | |||
*Silicon nitride | |||
*Very thin layers of PolySilicon | |||
*Photoresists | |||
*SU8 | |||
*Other polymers | |||
*Very thin layers of metals (<20 nm) | |||
*and many more | |||
|- | |||
|} | |||
[[Image:Dicetest_001.jpg|300x300px|thumb|test|left]] | [[Image:Dicetest_001.jpg|300x300px|thumb|test|left]] | ||