Specific Process Knowledge/Lithography/Coaters: Difference between revisions
| Line 549: | Line 549: | ||
!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Performance | !style="background:silver; color:black" align="center" valign="center" rowspan="1"|Performance | ||
|style="background:LightGrey; color:black"|Coating thickness | |style="background:LightGrey; color:black"|Coating thickness | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
* SU-8 resits 0.1-200+ µm | * SU-8 resits: 0.1-200+ µm | ||
* AZ 5214E 1.5-3 µm | * AZ 5214E: 1.5-3 µm | ||
* AZ 4562 8-15 µm | * AZ 4562: 8-15 µm | ||
* AZ MiR 701 1.5-3 µm | * AZ MiR 701: 1.5-3 µm | ||
* AZ nLOF 2020 2-3.5 µm | * AZ nLOF 2020: 2-3.5 µm | ||
|- | |- | ||
!style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters | !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters | ||
|style="background:LightGrey; color:black"|Spin speed | |style="background:LightGrey; color:black"|Spin speed | ||
|style="background:WhiteSmoke; color:black" align="center | |style="background:WhiteSmoke; color:black" align="center"| | ||
Vacuum chuck: 10 - 5000 rpm <br> | Vacuum chuck: 10 - 5000 rpm <br> | ||
Non-vacuum chuck: Max. 3000 rpm | Non-vacuum chuck: Max. 3000 rpm | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Spin acceleration | |style="background:LightGrey; color:black"|Spin acceleration | ||
|style="background:WhiteSmoke; color:black" align="center | |style="background:WhiteSmoke; color:black" align="center"| | ||
10 - 3000 rpm/s <br> | 10 - 3000 rpm/s <br> | ||
Max. 1500 rpm/s with Gyrset | Max. 1500 rpm/s with Gyrset | ||
| Line 569: | Line 569: | ||
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||
|style="background:LightGrey; color:black"|Substrate size | |style="background:LightGrey; color:black"|Substrate size | ||
|style="background:WhiteSmoke; color:black | |style="background:WhiteSmoke; color:black"| | ||
* 100 mm wafers | * 100 mm wafers | ||
* 150 mm wafers | * 150 mm wafers | ||
|- | |- | ||
| style="background:LightGrey; color:black"|Allowed materials | | style="background:LightGrey; color:black"|Allowed materials | ||
|style="background:WhiteSmoke; color:black" align="center | |style="background:WhiteSmoke; color:black" align="center"| | ||
All cleanroom materials ? | All cleanroom materials ? | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Batch | |style="background:LightGrey; color:black"|Batch | ||
|style="background:WhiteSmoke; color:black" align="center | |style="background:WhiteSmoke; color:black" align="center"| | ||
1 | 1 | ||
|- | |- | ||