Jump to content

Specific Process Knowledge/Thin Film deposition/ALD/TiO2 deposition using ALD: Difference between revisions

← Older editNewer edit →
VisualWikitext
Pevo (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
2,331 edits
No edit summary
Pevo (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
2,331 edits
No edit summary
Line 41: Line 41:


<gallery caption="Aluminium oxide thickness as function of number of cycles" widths="220px" heights="220px" perrow="5">
<gallery caption="Aluminium oxide thickness as function of number of cycles" widths="220px" heights="220px" perrow="5">
image:ALD_TiO2_grow_rate_150C.tif| Temperature 150 <sup>o</sup>C.
image:ALD_TiO2_grow_rate_150C.jpg| Temperature 150 <sup>o</sup>C.
image:ALD Al2O3 grow rate 200C.jpg| Temperature 200 <sup>o</sup>C.
image:ALD Al2O3 grow rate 200C.jpg| Temperature 200 <sup>o</sup>C.
image:ALD Al2O3 grow rate 250C.jpg| Temperature 250 <sup>o</sup>C.
image:ALD Al2O3 grow rate 250C.jpg| Temperature 250 <sup>o</sup>C.
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_Film_deposition/ALD/TiO2_deposition_using_ALD"