Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/SIMS settings: Difference between revisions

From LabAdviser
Bghe (talk | contribs)
No edit summary
Bghe (talk | contribs)
No edit summary
Line 1: Line 1:
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/IBE⁄IBSD_Ionfab_300/SIMS_settings click here]'''
{| border="1" style="text-align: center; width: 320px; height: 200px;"
{| border="1" style="text-align: center; width: 320px; height: 200px;"
|-
|-

Revision as of 10:09, 20 April 2015

Feedback to this page: click here

SIMS setting for different materials
  Lower plate Upper plate
Ti -1
Si -1 (2)
Al -1 1
Cr -1
Ni -6