Specific Process Knowledge/Wafer cleaning/IMEC: Difference between revisions
| Line 28: | Line 28: | ||
Time: 5 min | Time: 5 min | ||
(a yellow and a black spot) | (a yellow and a black spot) | ||
|Clean tank (cleanroom 4) and make your own or make in dedicated glass. | |Clean tank (cleanroom 4, 7-up bath for wafers) and make your own or make in dedicated glass. | ||
Pour up H2SO4 first, put wafers in carrier (USE this in steps4.1-4.6), add H2O2, wait 30 sec, dip wafers. | Pour up H2SO4 first, put wafers in carrier (USE this in steps4.1-4.6), add H2O2, wait 30 sec, dip wafers. | ||
|Maybe clean the tank the day before! | |Maybe clean the tank the day before! | ||
| Line 45: | Line 45: | ||
Time: 100 sec | Time: 100 sec | ||
(two black spots) | (two black spots) | ||
|Clean tank (cleanroom 4) and make your own, it needs 2 bottles | |Clean tank (cleanroom 4, tank for buffer with wetting solution) and make your own, it needs 2 bottles | ||
Bottles are in service room 2 on the left, pump is by Leica microscope in cleanroom 3 | Bottles are in service room 2 on the left, pump is by Leica microscope in cleanroom 3 | ||
|Bottle for mixing is in service room 2, use BHF pump from RCA fumehood! | |Bottle for mixing is in service room 2, use BHF pump from RCA fumehood! | ||