Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions
| Line 117: | Line 117: | ||
|Etch rate of thermal oxide | |Etch rate of thermal oxide | ||
|'''>110 nm/min (50% etch load) (09-03-2015)''' | |'''>110 nm/min (50% etch load) (09-03-2015)''' | ||
|- | |- | ||
|Selectivity to resist [:1] | |Selectivity to resist [:1] | ||