Jump to content

Specific Process Knowledge/Lithography/Coaters: Difference between revisions

← Older editNewer edit →
VisualWikitext
Chasil (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
547 edits
Chasil (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
547 edits
Line 233: Line 233:
!Comments
!Comments
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Silicon with native oxide
|Silicon with native oxide
|1,415
|1,405
|5%
|2,7%
|18/12 2014
|29/1 2015
|chasil
|chasil
|with HMDS. Average of 5 wafers
|with HMDS. Average of 5 wafers
Line 246: Line 247:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Silicon with native oxide
|Silicon with native oxide
|1,405
|1,446
|2,7%
|5,5%
|29/1 2015
|17/02 2015
|chasil
|chasil
|with HMDS. Average of 5 wafers
|with HMDS. Average of 3 wafers
 
|}
|}


Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Coaters"