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Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/PrD02: Difference between revisions

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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,565 edits
No edit summary
Line 20: Line 20:
| 4" Wafer with travka50 mask
| 4" Wafer with travka50 mask
| AZ standard  
| AZ standard  
| Si / 50+ %  
| Si / 50 %  
| Pegasus/jmli
| Pegasus/jmli
| 10 minute TDESC clean
| 10 minute TDESC clean
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