Jump to content

Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange: Difference between revisions

← Older editNewer edit →
VisualWikitext
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,565 edits
Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,565 edits
Line 285: Line 285:
| 0    <!-- O2 flow -->
| 0    <!-- O2 flow -->
| 2000      <!-- coil power -->
| 2000      <!-- coil power -->
| 2.5      <!-- etch time -->
! 2.5      <!-- etch time -->
| 26      <!-- etch pressure -->
| 26      <!-- etch pressure -->
| 0      <!-- C4F8 flow -->
| 0      <!-- C4F8 flow -->
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/showerheadchange"