Specific Process Knowledge/Lithography/CSAR: Difference between revisions

@@ Line 441: / Line 441: @@
-{| class="wikitable collapsible collapsed" style="border: 5px solid black;"  style="width: 90%;" align="center"
+{| class = "collapsible collapsed"  width=100% style = "border-radius: 10px; -moz-border-radius: 10px; -webkit-border-radius: 10px; -khtml-border-radius: 10px; -icab-border-radius: 10px; -o-border-radius: 10px; border: 3px solid #000000;"
-!colspan="7"|   SEM inspection of wafer 6.13, 50 nm exposed pattern, shot pitch 7 nm
+! width=15% |
+!colspan="7" width=85%|   SEM inspection of wafer 6.13, 50 nm exposed pattern, shot pitch 7 nm
 |-
 |-